Air-Bearing Stage System for
Ultra-High Precision Inspection
The new NANOStation® 300 air-bearing stage for nanometer scale inspection of 300 mm wafers, masks and other large samples is the result of more than a decade in AFM/SPM development.
The system is designed to provide highest stability and precision in surface measuring applications. The single plane architecture with the rigid granite base provides significant advantages over multi-component metal-made translation systems. Higher strength, smaller thermal expansion and lower mass enables rapid positioning with great accuracy.

•  For samples up to 300 mm x 300 mm (larger on request)
• Sample inspection via optical microscope (or any other optical tool)
• Coordinate transfer from all other inspection devices (ASCII)
• AFM/SPM performance: rms (Z) < 0.05 nm

The images show the NANOStation® 300 with the S.I.S. ULTRAObjective AFM/SPM and Vistec Semiconductor Systems microscope. Instead of the microscope also other inspection instruments may be integrated. Left: Complete NANOStation® 300 Right: Detail of the optical microscope, sample stage with 300 mm wafer and ULTRAObjective AFM/SPM scanning head

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