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Specifications of
the NANOStation® 300
- Lowest noise floor down to the sub-nanometer level
- Single plane design with air-bearing for high velocity movements
- High position accuracy and repeatability
- Coordinate transfer and macro programming
- Modular
design for the combination of AFM/SPM with additional inspection
techniques, e.g. optical microscopy, phase-shift interferometry,
confocal microscopy etc.
- Easily accessible for various types of wafer robots and mask handling systems
- Designed for optimal air flow and heat removal, low thermal drift
- Customized sample holders (e.g. wafer chuck)
AFM/SPM Specifications
| Scan Range: |
20 µm x 20 µm x 3 µm
40 µm x 40 µm x 4 µm
80 µm x 80 µm x 5 µm
200 µm x 200 µm x 8 µm (16 µm)
|
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rms: |
0.05 nm (Z)
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| SPM modes: |
all modes applicable,
for a list click here
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Stage Specifications
| Motor: |
electromagnetic, contactless
linear motor |
|
Stage repeatability: |
up to 100 nm |
| Optical encoder: |
accuracy class 1 µm
(Heidenhain LIP581) |
|
Vertical stability: |
< 0.05 nm |
| Travel range, x-y: |
550 mm x 300 mm |
|
Maximum velocity: |
500 mm/s |
| Stage
resolution : |
50 nm |
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Dimensions (LxWxH): |
1620 mm x 990 mm x 1530
mm |
| Absolute accuracy: |
± 1 µm |
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Weight : |
ca. 2000 kg |
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